Nanocrystals and quantum dots of group IV semiconductors (Stevenson Ranch, 2010). - ОГЛАВЛЕНИЕ / CONTENTS
Навигация

Архив выставки новых поступлений | Отечественные поступления | Иностранные поступления | Сиглы
ОбложкаNanocrystals and quantum dots of group IV semiconductors / ed. by T.V.Torchynska, Yu.V.Vorobiev. - Stevenson Ranch: American Scientific Publishers, 2010. - xiii, 279 p.: ill. - (Nanotechnology book series). - Incl. bibl. ref. - Ind.: p.275-279. - ISBN-10 1-58883-154-X; ISBN-13 978-1-58883-154-5
 

Оглавление / Contents
 
Preface ......................................................... v
About the Editors .............................................. xi
List of Contributors ......................................... xiii

CHAPTER 1
Nanocrystals and Quantum Dots: Some Physical Aspects
T.V. Torchynska
1  Introduction ................................................. 1
2  Quantum Size Effects ......................................... 2
   2.1  Weak Confinement ........................................ 3
   2.2  Strong Confinement ...................................... 5
3  Numerical Analyses of Quantum Size Effects ................... 5
4  Optical Transition Probabilities, Oscillator Strength and
   Exciton Recombination Rate in Nanocrystals and Quantum
   Dots ........................................................ 13
5  Oscillator Strength and Exciton Polariton Effects in
   Nanocrystals ................................................ 18
6  Size Dispersion and Emission Spectra of Quantum Dots ........ 18
7  Photoluminescence of Oxidized Si Nanocrystals ............... 20
8  Hot Carrier Ballistic Transport and Luminescence
   Excitation in Oxidized Si Nanocrystals ...................... 23
9  Surface Chemistry in Si Nanocrystalls and Quantum Dots ...... 25
10 Raman Scattering in Si Nanocrystals and Quantum Dots ........ 28
11 Electrical Transport in Nanocrystal and Quantum Dot
   Structures .................................................. 33
12 Summary ..................................................... 37
References ..................................................... 38

CHAPTER 2.
Si and Ge Quantum Dot Structures
T.V. Torchynska
1  Introduction ................................................ 42
2  Emission of Si Quantum Dots Embedded in Silicon Oxide ....... 43
   2.1  Si QDs in Silicon Oxide Prepared by RF-Magnetron
        Co-Sputtering Method ................................... 43
   2.2  Si QDs in Silicon Oxide Prepared by Thermal
        Evaporation Method ..................................... 49
   2.3  Si QDs in Silicon Oxide Prepared by Ion
        Implantation ........................................... 50
   2.4  Si QDs Prepared by Pulsed Laser Deposition ............. 52
   2.5  Si QDs Prepared by Chemical Vapor Deposition ........... 53
   2.6  Other Methods of Si QD Preparation ..................... 55
3  Emission of Ge Quantum Dots Embedded in the Silicon
   Oxide ....................................................... 56
4  Emission of Amorphous and Crystalline Si Quantum Dots
   Embedded in Silicon Nitride ................................. 58
5  Self-Assembled Si Quantum Dots on Insulated Substrates ...... 59
6  Self-Assembled Ge Quantum Dots on the Si Substrate .......... 61
   6.1  Ge QDs Grown by Molecular Beam Epitaxy ................. 61
   6.2  Controlled Processes of Ge/Si QD Nucleation ............ 62
7  New Technical Decisions for QD Emission Stimulation ......... 64
   7.1  Si QD Emission Enhancement by Surface Plasmons ......... 64
   7.2  Alkyl-Modified Silicon QDs ............................. 65
   7.3  Emission of Rare Earth Atoms in Si Nanocrystal
        Structures ............................................. 66
   7.4  Nanophotonic Structures ................................ 68
8  Si QD Light Emitting Devices ................................ 70
9  Ge/Si QD Photodetectors ..................................... 72
10 Spintronics with QDs ........................................ 76
11 Summary ..................................................... 79
References ..................................................... 79

CHAPTER 3
Si Nanocrystals and Quantum Dots Embedded in Amorphous Si
Matrix
L. Khomenkova
1  Introduction ................................................ 85
2  Amorphous Silicon: Past and Future .......................... 87
3  Preparation Techniques for α-Si:H ........................... 88
   3.1  Chemical Vapor Deposition and Its Modifications ........ 88
   3.2  Hot-Wire Chemical Vapor Deposition ..................... 92
4  Structural Properties and Chemical Composition of nc-Si:H
   Layers ...................................................... 93
   4.1  Structural Properties of the nc-Si:H Films ............. 93
   4.2  Chemical Composition of the Amorphous Layer ............ 99
5  Absorption Study in α-Si:H Films with NCs and QDs .......... 103
6  Light Emission Properties of α-Si:H Films with NCs and
   QDs ........................................................ 103
7  Solar Cell Application of α-Si:H Films with NCs and QDs .... 108
   References ................................................. 112

CHAPTER 4.
SiC Nanocrystal Structures
T.V. Torchynska, L.V. Shcherbyna
1  Introduction ............................................... 116
2  SiC Nanocrystal Applications and Perspectives .............. 116
   2.1  Porous SiC ............................................ 117
   2.2  SiC NCs in Organic Matrices ........................... 117
   2.3  SiC NCs in Inorganic Dielectric or Semiconductor
        Matrices .............................................. 118
   2.4  SiC NCs in Metallic or Ceramic Matrices ............... 119
   2.5  SiC Nanowires, Nanotubes and Nanoribbons .............. 119
3  Different Technologies for the Fabrication of SiC
   Nanocrystal Structures ..................................... 120
   3.1  Electrochemical Etching of the Bulk SiC ............... 120
   3.2  SiC Nanocrystals Embedded in Inorganic Matrix ......... 121
   3.3  SiC Nanocrystals and Quantum Dots Embedded in
        Organic Matrix ........................................ 123
4  Emission Study in SiC NC Structures ........................ 124
   4.1  Emission of SiC NCs in Porous SiC of Different
        Polytypes ............................................. 124
   4.2  Emission of 3C-SiC NCs in Amorphous SiC Matrix ........ 132
   4.3  Emission of 3C-SiC NCs in Amorphous Si02 Matrix ....... 134
   4.4  Emission of Colloidal 3C-SiC NCs in Different
        Solvents .............................................. 134
   4.5  Emission of SiCxNy NCs and SiCxNy/AlN
        Superlattices ......................................... 136
5  Raman Scattering, FTIR and Ultra violet-Visible
   Absorption Study in SiC NC Layers .......................... 136
   5.1  Raman Scattering Spectra of Porous SiC Layers ......... 136
   5.2  Raman Scattering Spectra of SiC NCs in Amorphous
        SiC ................................................... 141
   5.3  IR and Ultraviolet-Visible Absorption Study in SiC
        NC Layers ............................................. 143
6  Conclusions ................................................ 144
References .................................................... 144

CHAPTER 5.
Electrical Properties of Semiconductor Nanocrystals and
Quantum Dots in Dielectric Matrix
I.V. Antonova
1  Introduction ............................................... 149
2  Room Temperature Quantum Size Effects in Thin Nanometer
   Scale Oxide with Si (Ge) NCs and QDs ....................... 151
3  Resonant Tunneling and Charging Effects in Thick
   Dielectric Layers with NCs and QDs ......................... 157
4  Single-Electron Charging Effect in the Individual Si QDs
   Covered with Thin Dioxide .................................. 161
5  Collective Single Electron Effects in Double-Oxide
   Barrier Structures with Si QDs ............................. 164
6  Carrier Tunneling in the Si-QDs/SiO2 Superlattices ......... 168
7  Photoconductivity of Si-QDs/SiO2 Layers .................... 171
8  Conductivity Mechanisms in Semiconductor NC or QD Arrays
   Embedded in a Dielectric Matrix ............................ 173
9  Static Dielectric Constant of Silicon QDs Embedded in a
   SiO2 Matrix ................................................ 176
10 Electron Transport in Si-QD Based Single Electron
   Transistors (SETs) and Si NC Material Optimization
   Towards the Room-Temperature Single-Electron Devices ....... 178
11 Summary .................................................... 183
References .................................................... 184

CHAPTER 6.
Optical Properties of Nanostructured Materials
Yu.V. Vorobiev, T.V. Torchynska
1  Introduction ............................................... 188
2  Nanostructured Materials for Optical Applications
   (Scale, Geometry Physical and Technological Aspects) ....... 188
   2.1  Sol-Gel Made Nanostructured Optical Materials ......... 189
   2.2  Nanocrystals in Zeolite Cavities ...................... 192
   2.3  Nanoporous Materials .................................. 193
   2.4  Some Extraordinary Optical Properties of
        Nanostructured Materials (Gigantic Non-Linearity
        Enhanced Sensitivity to Polarization and
        Wavelength) ........................................... 194
3  Peculiarities of Electromagnetic Waves Propagation in
   Nanomaterials. Effective Parameters of the Nanocomposite
   Media ...................................................... 196
   3.1  Non-Periodic Nanostructured Materials ................. 196
   3.2  Effects of Spatial Periodicity on Electromagnetic
        Wave Propagation ...................................... 199
4  Theoretical Description of the Optical Electronic
   Transitions in Nanostructures of Different Geometry ........ 203
   4.1  Traditional Approach in the Quantum Mechanical
        Treatment of the Optical Properties of
        Nanostructures ........................................ 203
   4.2  Effect of the Boundary Conditions on the Solution
        of the Schrodinger Equation for Different
        Structures ............................................ 205
   4.3  "Mirror" Boundary Conditions in the Treatment of
        the Nanostructures .................................... 207
5  Nanostructured Optical Components and Devices .............. 215
   5.1  Nanostructured Filters, Waveguides, and
        Antireflection Coatings ............................... 215
   5.2  Nanostructured Materials in Solar Energy Conversion
        Devices ............................................... 218
References .................................................... 221

CHAPTER 7.
Nanocrystal Memory Structures
Zs.J. Horváth, P. Basa
1  Introduction ............................................... 225
2  Non-Volatile MIS Memory Devices ............................ 226
   2.1  Conventional Non-Volatile Memory Devices .............. 226
   2.2  Problems and Possible Ways of Solution ................ 227
   2.3  Charging Process ...................................... 229
   2.4  Memory Structures with Semiconductor Nanocrystals ..... 231
3  Preparation of MIS Memory Structures with Si, Ge, or
   SiGe Nanocrystals .......................................... 232
   3.1  Ion Beam Synthesis of Nanocrystals .................... 232
   3.2  Layer by Layer Growth ................................. 234
   3.3  Direct CVD Growth of Nanocrystals ..................... 238
4  MIS Memory Structures with Silicon or Germanium
   Nanocrystals ............................................... 239
   4.1  Memory Structures with Silicon Nanocrystals ........... 239
   4.2  Memory Structures with Germanium Nanocrystals ......... 241
5  Silicon Nitride-Based Nanocrystal Memory Structures ........ 243
6  Summary .................................................... 248
References .................................................... 248

CHAPTER 8
Technological Applications of Porous SiC
M. Mynbaeva, K. Mynbaev
1  Introduction ............................................... 253
2  Properties of Stoichiometric Porous Silicon Carbide ........ 254
3  Diffusion Doping of Porous SiC ............................. 257
4  Porous SiC in Substrate Technology ......................... 265
   4.1  Homoepitaxy Over Stoichiometric Porous SiC ............ 265
   4.2  Heteroepitaxy Over Stoichiometric Porous SiC .......... 268
5  Conclusions ................................................ 271
References .................................................... 271

Index ......................................................... 275


Архив выставки новых поступлений | Отечественные поступления | Иностранные поступления | Сиглы
 

[О библиотеке | Академгородок | Новости | Выставки | Ресурсы | Библиография | Партнеры | ИнфоЛоция | Поиск]
  Пожелания и письма: branch@gpntbsib.ru
© 1997-2024 Отделение ГПНТБ СО РАН (Новосибирск)
Статистика доступов: архив | текущая статистика
 

Документ изменен: Wed Feb 27 14:22:26 2019. Размер: 16,290 bytes.
Посещение N 2103 c 26.07.2011